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Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

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==Global alignment - jobdeck file==
==Global alignment - jobdeck file==
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JOB/W    'ELELOP',4 ; 4inch wafer
JOB/W    'ELELOP',4
 
GLMPOS P =(-36000,0), Q=(36000,0) ; Position of the alignment Global Marks, give the coordinates of their position first the left one (P) and then the right one (Q)
GLMP 2, 450,0,0 ; Type of mark it is looking for. The information is given by the line width, and the leg length and 0,0 in case of using a cross that is not rotated


GLMPOS P =(-36000,0), Q=(36000,0)
GLMP 2, 450,0,0


PATH DRF5M
PATH DRF5M
Line 268: Line 267:
PEND
PEND


LAYER 1
LAYER 1
P(1)  'elelop_GIST_L2.v30'
P(1)  'elelop_GIST_L2.v30'
SPPRM 4.0,,,,1.0,1
SPPRM 4.0,,,,1.0,1
STDCUR  6.6   ; x nA + 10% ; CHANGE
STDCUR  6.6  
OBJAPT 5
OBJAPT 5
       
     
MOD001: MODULAT (( 0, -1.0 ) , ( 1,  0.0 ) , ( 2,  1.0 )
-    , ( 3,  2.0 ) , ( 4,  3.0 ) , ( 5,  4.1 )
-    , ( 6,  5.1 ) , ( 7,  6.2 ) , ( 8,  7.2 )
-    , ( 9,  8.3 ) , ( 10,  9.4 ) , ( 11, 10.5 )
-    , ( 12, 11.6 ) , ( 13, 12.7 ) , ( 14, 13.8 )
-    , ( 15, 14.9 ) , ( 16, 16.1 ) , ( 17, 17.3 )
-    , ( 18, 18.4 ) , ( 19, 19.6 ) , ( 20, 20.8 )
-    , ( 21, 22.0 ) , ( 22, 23.2 ) , ( 23, 24.5 )
-    , ( 24, 25.7 ) , ( 25, 27.0 ) , ( 26, 28.2 )
-    , ( 27, 29.5 ) , ( 28, 30.8 ) , ( 29, 32.1 )
-    , ( 30, 33.5 ) , ( 31, 34.8 ) , ( 32, 36.1 )
-    , ( 33, 37.5 ) , ( 34, 38.9 ) , ( 35, 40.3 )
-    , ( 36, 41.7 ) , ( 37, 43.1 ) , ( 38, 44.5 )
-    , ( 39, 46.0 ) , ( 40, 47.4 ) , ( 41, 48.9 )
-    , ( 42, 50.4 ) , ( 43, 51.9 ) , ( 44, 53.4 )
-    , ( 45, 54.9 ) , ( 46, 56.5 ) , ( 47, 58.1 )
-    , ( 48, 59.6 ) , ( 49, 61.2 ) , ( 50, 62.8 )
-    , ( 51, 64.5 ) , ( 52, 66.1 ) , ( 53, 67.8 )
-    , ( 54, 69.4 ))
 
; JDI file values for PEC
 
END
END
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