Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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== Alignment preparation == | == Alignment preparation == | ||
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Illustration of wafer scale pattern alignment and chip array alignment. | |||
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=== Boundary box alignment === | === Boundary box alignment === | ||
In continuation of the example above, if two layers/exposures are to be aligned to each other in subsequent process steps it is vital that the two layers boundary boxes are identical or at least symmetric around (0,0). With reference to the example below, the boundary boxes can be made identical by either | In continuation of the example above, if two layers/exposures are to be aligned to each other in subsequent process steps it is vital that the two layers boundary boxes are identical or at least symmetric around (0,0). With reference to the example below, the boundary boxes can be made identical by either | ||