Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist: Difference between revisions
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;;*** Mask Exposure Peformance Test *** | ;;*** Mask Exposure Peformance Test *** | ||
MASK00: INITIAL HEIMAP,CURRNT,INITBE,PDEFBE,DISTBE,PDEFBE,SUBDEFBE | MASK00: INITIAL HEIMAP,CURRNT,INITBE,PDEFBE,DISTBE,PDEFBE,SUBDEFBE | ||
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CYCLIC CURRNT | CYCLIC CURRNT | ||
CYCLE 30M | CYCLE 30M | ||
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