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Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist: Difference between revisions

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<pre>
;;*** Mask Exposure Peformance Test ***
;;*** Mask Exposure Peformance Test ***
  MASK00: INITIAL HEIMAP,CURRNT,INITBE,PDEFBE,DISTBE,PDEFBE,SUBDEFBE  
  MASK00: INITIAL HEIMAP,CURRNT,INITBE,PDEFBE,DISTBE,PDEFBE,SUBDEFBE  
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         CYCLIC  CURRNT
         CYCLIC  CURRNT
         CYCLE  30M
         CYCLE  30M
</pre>