Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

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 '''JOB [/W] [‘name’], d1 [, d2]'''
-The common block starts with a JOB command. The /W switch indicates a round wafer slot, if omitted the system expects a square mask slot. Almost all cassettes at DTU Nanolab are wafer cassettes and thus require the /W switch for the pattern to be exposed at the correct slot coordinates. The name is optional and limited to 9 alphanumeric characters in uppercase. Following the optional name is the slot size designation '''d1''', unit is inches. In the example it is a 4” wafer. A second dimension '''d2''' can be added to constrain chip placement from the ARRAY command within that dimension. Please refer to Figure 2 for an example of this. XXX
+The common block starts with a JOB command. The /W switch indicates a round wafer slot, if omitted the system expects a square mask slot. Almost all cassettes at DTU Nanolab are wafer cassettes and thus require the /W switch for the pattern to be exposed at the correct slot coordinates. The name is optional and limited to 9 alphanumeric characters in uppercase. Following the optional name is the slot size designation '''d1''', unit is inches. In the example it is a 4” wafer. A second dimension '''d2''' can be added to constrain chip placement from the ARRAY command within that dimension, see below for an example of this.
 Be aware that the chip cassettes at DTU Nanolab are converted 3” wafer cassettes and hence the correct header for an exposure on these will be '''JOB /W ‘name’, 3'''.
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:EBL_Achk_limit.png|300px]]
+|-
+| colspan="1" style="text-align:center;|
+Chip placement on a 4" wafer constrained to a 3.6" circle using '''JOB [/W] [‘name’], 4, 3.6'''.
+|}