Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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'''JOB [/W] [‘name’], d1 [, d2]''' | '''JOB [/W] [‘name’], d1 [, d2]''' | ||
The common block starts with a JOB command. The /W switch indicates a round wafer slot, if omitted the system expects a square mask slot. Almost all cassettes at DTU Nanolab are wafer cassettes and thus require the /W switch for the pattern to be exposed at the correct slot coordinates. The name is optional and limited to 9 alphanumeric characters in uppercase. Following the optional name is the slot size designation, unit is inches. In the example it is a 4” wafer. A second dimension | The common block starts with a JOB command. The /W switch indicates a round wafer slot, if omitted the system expects a square mask slot. Almost all cassettes at DTU Nanolab are wafer cassettes and thus require the /W switch for the pattern to be exposed at the correct slot coordinates. The name is optional and limited to 9 alphanumeric characters in uppercase. Following the optional name is the slot size designation '''d1''', unit is inches. In the example it is a 4” wafer. A second dimension '''d2''' can be added to constrain chip placement from the ARRAY command within that dimension. Please refer to Figure 2 for an example of this. XXX | ||
Be aware that the chip cassettes at DTU Nanolab are converted 3” wafer cassettes and hence the correct header for an exposure on these will be | Be aware that the chip cassettes at DTU Nanolab are converted 3” wafer cassettes and hence the correct header for an exposure on these will be '''JOB /W ‘name’, 3'''. | ||