Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
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|style="background:LightGrey; color:black"|ALD (atomic layer deposition) of | |style="background:LightGrey; color:black"|ALD (atomic layer deposition) of | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Al<sub>2</sub>O<sub>3</sub> | *Al<sub>2</sub>O<sub>3</sub> (amorphous) | ||
*TiO<sub>2</sub> (amorphous or anatase) | *TiO<sub>2</sub> (amorphous or anatase) | ||
*HfO<sub>2</sub> | *HfO<sub>2</sub> (polycrystalline) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||