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Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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*TiCl<sub>4</sub>
*TiCl<sub>4</sub>
*H<sub>2</sub>O
*H<sub>2</sub>O
*O<sub>3</sub> - Not available at the moment
*O<sub>3</sub>
*O<sub>2</sub>
*O<sub>2</sub> - Not available at the moment
*TEMAHf
*TEMAHf
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