Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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==Writing speed== | ==Writing speed== | ||
According to specs, the writing speed of Aligner: Maskless 03 is | According to specs, the writing speed of Aligner: Maskless 03 is 1100 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode reduces this speed to approximately 440 mm<sup>2</sup>/min. The writing speed for a 100 x 100 mm<sup>2</sup> area measured during installation of the machine (acceptance test) was ~1200 mm<sup>2</sup>/min. | ||
[[Image:MLA3_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 03 as a function of the exposure area. Data and graph by Thomas Anhøj @ DTU Nanolab, 2020.]] | [[Image:MLA3_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 03 as a function of the exposure area. Data and graph by Thomas Anhøj @ DTU Nanolab, 2020.]] | ||
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'''Speed vs. area:''' | '''Speed vs. area:''' | ||
During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For samples slightly smaller than a | During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For samples slightly smaller than a 100 mm wafer, the writing speed of Aligner: Maskless 03 drops below the specified 1100 mm<sup>2</sup>/min. | ||
When the exposure is started on the maskless aligner, the software starts converting the design to the data needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample while more data is being generated. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (exposed) the data may be reused for repeated exposures (Offline conversion). However, the converted data can only be reused if no alignment is needed, including flat alignment ("Expose with Global Angle"). Due to the powerful, separate conversion PC on Aligner: Maskless 03, offline exposure is only very slightly faster than online. | When the exposure is started on the maskless aligner, the software starts converting the design to the data needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample while more data is being generated. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (or exposed) the data may be reused for repeated exposures (Offline conversion). However, the converted data can only be reused if no alignment is needed, including flat alignment ("Expose with Global Angle"). Due to the powerful, separate conversion PC on Aligner: Maskless 03, offline exposure is only very slightly faster than online. | ||
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'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||
The writing speed of Aligner: Maskless 03 remains constant up to a dose of | The writing speed of Aligner: Maskless 03 remains constant up to a dose of 500 mJ/cm<sup>2</sup>. After this point, the writing speed decreases with increasing dose. The writing speed is 50% at a dose around 2000 mJ/cm<sup>2</sup>. | ||
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