Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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Aligner: Maskless 02 offers two autofocus modes; optical or pneumatic. The autofocus mode is selected via the substrate template. The defocus process parameter is used to compensate for offsets between the autofocus mechanism and the focal point of the exposure light, and simultaneously optimize print quality in different resists and varying thicknesses. | Aligner: Maskless 02 offers two autofocus modes; optical or pneumatic. The autofocus mode is selected via the substrate template. The defocus process parameter is used to compensate for offsets between the autofocus mechanism and the focal point of the exposure light, and simultaneously optimize print quality in different resists and varying thicknesses. | ||
'''Optical:''' | '''Optical:''' | ||
Works for substrates down to 3x3 mm. | Works for substrates down to 3x3 mm. | ||
'''Pneumatic:''' | '''Pneumatic:''' | ||
Substrates must be at least 5x5 mm to be successfully loaded. The pneumatic AF freezes at a distance of 3 mm form the substrate edge, which means that in order to have any ''dynamic'' focusing, using the pneumatic AF, the substrate must be larger than 6x6 mm. | Substrates must be at least 5x5 mm to be successfully loaded. The pneumatic AF freezes at a distance of 3 mm form the substrate edge, which means that in order to have any ''dynamic'' focusing, using the pneumatic AF, the substrate must be larger than 6x6 mm. | ||