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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,890 edits
Tag: Manual revert
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'''Fast''' mode is used for maximum exposure speed.<br>
'''Fast''' mode is used for maximum exposure speed.<br>
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time by 2.5 times, but also increases the size of the address grid in the X-direction by 2.5. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode.
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time by 2.5 times, but also increases the size of the address grid in the X-direction by 2.5. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode.
<span style="color:red">New specs after the new writehead has been installed - section will be updated soon.</span>


==Writing speed==
==Writing speed==
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