Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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==Exposure time estimation== | ==Exposure time estimation== | ||
The writing time should always be estimated prior to an exposure session. The writing time ''t'' [s] is a function of exposure dose ''Q'' [C/cm<sup>2</sup>], pattern area ''A'' [m<sup>2</sup>] and beam current ''I'' [A], as | The writing time should always be estimated prior to an exposure session. The writing time ''t'' [s] is a function of exposure dose ''Q'' [C/cm<sup>2</sup>], pattern area ''A'' [m<sup>2</sup>] and beam current ''I'' [A], can calculated as | ||
''t = QA/I'' | ''t = QA/I'' | ||