Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide: Difference between revisions
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As a rule of thumb and easy extrapolation exposure of an area of 1.000.000 µm<sup>2</sup> at 1 nA and exposure dose of 100 µC/cm<sup>2</sup> takes 17 min. A simple Excel sheet to estimate writing time is [[:File:WritingTimeEstimator.xlsx]] | As a rule of thumb and easy extrapolation exposure of an area of 1.000.000 µm<sup>2</sup> at 1 nA and exposure dose of 100 µC/cm<sup>2</sup> takes 17 min. A simple Excel sheet to estimate writing time is [[:File:WritingTimeEstimator.xlsx|available here.]] | ||
The e-beam scanning frequency f (Hz) is a function of the e-beam scanning step, p (shot step), as shown below: | The e-beam scanning frequency f (Hz) is a function of the e-beam scanning step, p (shot step), as shown below: | ||