Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide: Difference between revisions
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The writing time should always be estimated prior to an exposure session. The writing time ''t'' [s] is a function of exposure dose ''Q'' [C/cm<sup>2</sup>], pattern area ''A'' [m<sup>2</sup>] and beam current ''I'' [A], as given below: | The writing time should always be estimated prior to an exposure session. The writing time ''t'' [s] is a function of exposure dose ''Q'' [C/cm<sup>2</sup>], pattern area ''A'' [m<sup>2</sup>] and beam current ''I'' [A], as given below: | ||
''t = QA/ | ''t = QA/I'' | ||
As a rule of thumb and easy extrapolation exposure of an area of 1.000.000 µm<sup>2</sup> at 1 nA and exposure dose of 100 µC/cm<sup>2</sup> takes 17 min. A simple Excel sheet to estimate writing time is [[O:\CleanroomDrive\_E-beam_programs\WritingTimeEstimator.xlsx|available here.]] | |||
The e-beam scanning frequency f (Hz) is a function of the e-beam scanning step, p (shot step), as shown below: | The e-beam scanning frequency f (Hz) is a function of the e-beam scanning step, p (shot step), as shown below: | ||