Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

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 The JDF is terminated with a END command.
+==Beam pitch and dose relationship==
+The SDF command '''SHOT A, n''' defines the shot pitch in steps of 0.25 nm as described above.
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:BeamPitch.png|1000px]]
+|-
+| colspan="1" style="text-align:center;|
+Example feature filled with beam shots at one times beam diameter (left) and half beam diameter (right). Illustration: Thomas Pedersen.
+|}