Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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===Result of a PEC process=== | ===Result of a PEC process=== | ||
Once a PEC node has been applied to a design and executed the design is broken into a number of '''shot ranks'''. Each shot rank has a specific dose associated with it. The doses and and how they are applied to the pattern can be seen in the pattern viewer by clicking on the '''Color by Dose''' button and selecting the '''Dose''' tree. | Once a PEC node has been applied to a design and executed the design is broken into a number of '''shot ranks'''. Each shot rank has a specific dose associated with it. The doses and and how they are applied to the pattern can be seen in the pattern viewer by clicking on the '''Color by Dose''' button and selecting the '''Dose''' tree. In general, large and dense strcutures will be modulated down in dose to accuont for abundant backscatter exposure while small and sparse features will be modulated to a higher dose since there is little backscatter exposure in those areas. | ||
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