Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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== Proximity Effect Correction (PEC) == | == Proximity Effect Correction (PEC) == | ||
===Background information=== | |||
Proximity Effect Correction (or Proximity Error Correction) is a huge topic in EBL and here we will demonstrate the simplest way to apply PEC to your pattern using Beamer. For further information and more advanced uses of Beamer we advise users to go through [https://www.genisys-gmbh.com/webinar-series-beamer-training.html the tutorials on GenISys own website.] | Proximity Effect Correction (or Proximity Error Correction) is a huge topic in EBL and here we will demonstrate the simplest way to apply PEC to your pattern using Beamer. For further information and more advanced uses of Beamer we advise users to go through [https://www.genisys-gmbh.com/webinar-series-beamer-training.html the tutorials on GenISys own website.] | ||
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===The PEC node in Beamer=== | |||
Beamer provides three methods of defining a PSF: | Beamer provides three methods of defining a PSF: | ||
*Load a pre-computer PSF from the archives | *Load a pre-computer PSF from the archives | ||