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Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 10: Line 10:
*Bulk and sleeve separation
*Bulk and sleeve separation
*Proximity Effect Correction
*Proximity Effect Correction
*Pattern fracturing
*Field sorting
*Export for writing
*Export for writing


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