Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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==Resist coating== | ==Resist coating== | ||
DTU Nanolab offers a few different standard resist as given in the table below. Typically layers of 50-500 nm are applied. The Gamma | DTU Nanolab offers a few different standard resist as given in the table below. Typically layers of 50-500 nm are applied. [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_E-beam_and_UV_processing|The Gamma E-beam and UV coater]] has predefined recipes for various thickness of CSAR resist. For other thickness or other resist the more manual Lab Spin 2 or 3 coasters can be used. | ||
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