Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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==Tutorial job== | ==Tutorial job== | ||
The tutorial demonstrates one way to set up a dose test of a particular pattern on a blank 4" silicon wafer. Dose testing is often necessary to obtain the desired critical dimension and it is vital to be able to set up such a job in an efficient manner. In this tutorial we set up the dose variation (modulation) by manually writing a short modulation table. For more complex dose tests or dose test of proximity corrected patterns one should consider using the Chipplace module | The tutorial demonstrates one way to set up a dose test of a particular pattern on a blank 4" silicon wafer. Dose testing is often necessary to obtain the desired critical dimension and it is vital to be able to set up such a job in an efficient manner. In this tutorial we set up the dose variation (modulation) by manually writing a short modulation table. For more complex dose tests or dose test of proximity corrected patterns one should consider using the [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER#ChipPlace_-_easy_dose_test_setup|Chipplace module]] in Beamer. | ||
The pattern used in this example is a DTU logo with a size of 5 x 8 µm<sup>2</sup>. | The pattern used in this example is a DTU logo with a size of 5 x 8 µm<sup>2</sup>. | ||