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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,224 edits
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| PEC || Used to apply Proximity Effect Correction to a pattern
| PEC || Used to apply Proximity Effect Correction to a pattern
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| Example || Example
| ChipPlace || Graphical interface to set up arrays of patterns and assign dose to each element, excellent for dose testing
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| Example || Example
| Example || Example
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