Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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'''Feedback to this page''': '''[mailto:e-beam@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]''' | '''Feedback to this page''': '''[mailto:e-beam@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]''' | ||
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|550px]]= | |||
=Beamer guide= | =Beamer guide= | ||
All users of the JEOL 9500 system must have their pattern converted to the JEOL52 V3.0 (V30) format. This is typically done using Beamer. Beamer can however do many other operations than a simple format conversion. In this section we will dive into some of the most useful functions of Beamer. | All users of the JEOL 9500 system must have their pattern converted to the JEOL52 V3.0 (V30) format. This is typically done using Beamer. Beamer can however do many other operations than a simple format conversion. In this section we will dive into some of the most useful functions of Beamer. | ||
== | == Proximity Effect Correction == | ||