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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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*Choose '''Raster X''' in '''Deploy Mode''' to increase dose from left to right for all rows
*Choose '''Raster X''' in '''Deploy Mode''' to increase dose from left to right for all rows
*Click '''OK''' in both open windows to see the result
*Click '''OK''' in both open windows to see the result
This will produce a 10 x 2 array of the pattern with a relative dose from 1 to 2. Remember this dose is acting as a multiplier onto the base dose defined by '''RESIST''' in the SDF file. Thus if a base dose of 200 is defined by '''RESIST''' this setup will start at 200 µC/cm<sup>2</sup> and end at 400 µC/cm<sup>2</sup>.


{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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|-  
|-  
| colspan="2" style="text-align: center;|
| colspan="2" style="text-align: center;|
Dose label are added (see '''Texts''' pane) but not visible at this zoom level. Indicated for each element is relative dose X and array number (x,y). Image: Thomas Pedersen.
Indicated for each element in the viewport is relative dose X and array number (x,y). Image: Thomas Pedersen.
|}
|}
This will produce a 10 x 2 array of the pattern with a relative dose from 1 to 2. Remember this dose is acting as a multiplier onto the base dose defined by '''RESIST''' in the SDF file. Thus if a base dose of 200 is defined by '''RESIST''' this setup will start at 200 µC/cm<sup>2</sup> and end at 400 µC/cm<sup>2</sup>.


To make analysis of the post exposure result easier let us add a dose label to each array element. This dose label will be exposed along with the pattern and thus when inspecting the result in SEM the dose will be visible next to the pattern. It is very easy to add:
To make analysis of the post exposure result easier let us add a dose label to each array element. This dose label will be exposed along with the pattern and thus when inspecting the result in SEM the dose will be visible next to the pattern. It is very easy to add:
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