Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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*Choose '''Dose Series''' and enter a start and end value. This is relative dose, i.e. a multiplier on the base dose defined by RESIST in the SDF file | *Choose '''Dose Series''' and enter a start and end value. This is relative dose, i.e. a multiplier on the base dose defined by RESIST in the SDF file | ||
*Choose '''Raster X''' in '''Deploy Mode''' to increase dose from left to right for all rows | *Choose '''Raster X''' in '''Deploy Mode''' to increase dose from left to right for all rows | ||
*Click '''OK''' in both open windows to see the result | |||
This will produce a 10 x 2 array of the pattern with a relative dose from 1 to 2. Remember this dose is acting as a multiplier onto the base dose defined by '''RESIST''' in the SDF file. Thus if a base dose of 200 is defined by '''RESIST''' this setup will start at 200 µC/cm<sup>2</sup> and end at 400 µC/cm<sup>2</sup>. | This will produce a 10 x 2 array of the pattern with a relative dose from 1 to 2. Remember this dose is acting as a multiplier onto the base dose defined by '''RESIST''' in the SDF file. Thus if a base dose of 200 is defined by '''RESIST''' this setup will start at 200 µC/cm<sup>2</sup> and end at 400 µC/cm<sup>2</sup>. | ||
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*Assign a y-axis offset of for instance -100 µm to avoid having the label printed on top of the pattern itself | *Assign a y-axis offset of for instance -100 µm to avoid having the label printed on top of the pattern itself | ||
*Assign a decent size in the '''Size''' window, 20 µm will work for most cases | *Assign a decent size in the '''Size''' window, 20 µm will work for most cases | ||
*Click '''OK''' in the bottom of the window to return to the Beamer view | |||
*Run the Chipplace node to see the result | |||
*Add a '''Export''' node and export the result as normal | |||
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| colspan="2" style="text-align: center;| | | colspan="2" style="text-align: center;| | ||
The array and dose assignment can be set up with just a few inputs. Dose label are not visible in this view. Image: Thomas Pedersen. | The array and dose assignment can be set up with just a few inputs. Dose label are not visible in this view. Image: Thomas Pedersen. | ||
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
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| [[image:BEAMER_5.png|600px]] || [[image:BEAMER_6.png|600px]] | |||
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| colspan="2" style="text-align: center;| | |||
Final result of the Chipplace node with relative doses from 1 to 2 and dose labels in place. Image: Thomas Pedersen. | |||
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