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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
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*Add the Chipplace node
*Add the Chipplace node
*In the '''Substrate''' tab define the substrate size. This is purely for visualization of how the pattern fits on the substrate
*In the '''Substrate''' tab define the substrate size. This is purely for visualization of how the pattern fits on the substrate
Work in progress. THOPE 2023-02-24


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Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen.
Import a design and add the Chipplace node. In Chipplace choose a substrate size to visualize placement within the substrate. Image: Thomas Pedersen.
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*Go to the '''Array and Data tab'''
*Click '''Add Array'''
*In '''Data to place''' choose '''Chip'''. It will then take the pattern connected to the Chipplace module
*Fill in array data in '''Repitition''' and '''Pitch''' to create as many dose test instance as you want. In this case we create a 10 x 2 array
*Choose '''Center''' in '''Position Mode''' to have everything centered in the final output pattern (V30 file)
*Click '''Assign Dose''' to open up the dose assignment page
*Choose '''Dose Series''' and enter a start and end value. This is relative dose, i.e. a multiplier on the base dose defined by RESIST in the SDF file
*Choose '''Raster X''' in '''Deploy Mode''' to increase dose from left to right for all rows
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The array and dose assignment can be set up with just a few inputs. Image: Thomas Pedersen.
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