Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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The pattern used in this example is a DTU logo with a size of 5 x 8 µm<sup>2</sup>. | The pattern used in this example is a DTU logo with a size of 5 x 8 µm<sup>2</sup>. | ||
==JEOL 9500 | ==JEOL 9500 workflow== | ||
The workflow of | The workflow of the tutorial job is summarized below and explained in detail in the subsequent sections. In order to optimize usage of the system steps 1 through 3 must all be done ahead of the booked session on the 9500 system. | ||
#Substrate preparation - resist coating | #Substrate preparation - resist coating | ||