Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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Resulting setup from the example job. The pattern (DTU logo) is instanced 10 times with a pitch of 50 µm. The dose is modulated between 200 and 290 µC/cm<sup>2</sup>. | Resulting setup from the example job. The pattern (DTU logo) is instanced 10 times with a pitch of 50 µm. The dose is modulated between 200 and 290 µC/cm<sup>2</sup>. Pattern size is increased by factor of 4 for visibility. | ||
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