Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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 The pattern used in this example is very small and centred around (0,0). The example above will create a 3x3 matrix of height data with a pitch of 1 mm in x and y. After execution the system will display a matrix with height measurement data in µm. Verify that there are no outliers and that variation is less than 100 µm.
+==Save condition file==
+For the calibration data to have effect during exposure the data must be saved into the calibration profile. This is done via the '''SAVE''' subprogram from the '''Calibration''' window.
+*Select the '''SAVE''' subprogram
+*Click '''Edit Parameter...'''
+*From the '''SAVE''' window click '''Acquisition of latest status'''
+*Wait 5 seconds for the window to populate with data
+*Click '''Apply''' and '''Save'''
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:9500save1.png|600px]]
+|-
+| colspan="1" style="text-align:center;|
+Acquire the calibration data and then apply the data to save. Image: Thomas Pedersen.
+|}
+Alle of the calibration data is now saved and the system is ready for exposure.
 =Development=