Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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In this example the two drift measurements are made a bit more than 1 minute apart (look at timestamps). The x-axis drift has changed from 65.4 nm to 64.2 nm, i.e. a change of 1.2 nm in about 1 minute. The y-axis drift has changed from 85.3 nm to 86.8 nm, a shift of 1.5 nm in about 1 minute. Thus the drift is about 1-1.5 nm/min in this particular example. This is a typical value. If you experience drift of 5-10 nm/min, give the system 10 min to thermally equilibrate and try again. If drift is above 10 nm/min please call the e-beam personnel. | In this example the two drift measurements are made a bit more than 1 minute apart (look at timestamps). The x-axis drift has changed from 65.4 nm to 64.2 nm, i.e. a change of 1.2 nm in about 1 minute. The y-axis drift has changed from 85.3 nm to 86.8 nm, a shift of 1.5 nm in about 1 minute. Thus the drift is about 1-1.5 nm/min in this particular example. This is a typical value. If you experience drift of 5-10 nm/min, give the system 10 min to thermally equilibrate and try again. If drift is above 10 nm/min please call the e-beam personnel. | ||
==Measure height profile of sample== | |||
The height of the sample surface must be known to focus the electron beam properly at the surface. This can be done using the '''HEIMAP''' subprogram. | |||
*Select on the '''HEIMAP''' subprogram in the '''Calibration''' window | |||
*Click '''Edit Parameter...''' | |||
*This opens the '''HEIMAP''' parameters window, make sure to edit the following parameters | |||
** | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
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| [[image:9500heimap1.png|600px]] | |||
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Parameters of the '''HEIMAP''' subprogram. Image: Thomas Pedersen. | |||
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=Development= | =Development= | ||