Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
Appearance
| Line 404: | Line 404: | ||
Correct result of '''INITAE''' (left) and '''INITBE''' (right). Image: Thomas Pedersen. | Correct result of '''INITAE''' (left) and '''INITBE''' (right). Image: Thomas Pedersen. | ||
|} | |} | ||
Correct execution will look like above. '''INITAE''' uses the beam to scan a PN-junction which the system uses to determine beam position and shape. '''INITBE''' uses the beam to scan a gold marker on the stage which the system uses for position and distortion correction of the beam placement within the writing field. | |||
=Development= | =Development= | ||