Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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==Select and restore the system to the chosen beam current profile== | ==Select and restore the system to the chosen beam current profile== | ||
The SDF specifies which system condition file to use for the exposure, this determines the beam current. In this tutorial the chosen condition file is '''6nA_ap5'''. Thus we restore the system and cloumn to this condition file. This is done from the '''Calib''' window, if it is not open it can be opened from the '''EBX Menu'''. | The SDF specifies which system condition file to use for the exposure, this determines the beam current. In this tutorial the chosen condition file is '''6nA_ap5'''. Thus we restore the system and cloumn to this condition file. This is done from the '''Calib''' window, if it is not open it can be opened from the '''EBX Menu'''. | ||
*In the '''Calib''' window press '''RESTOR''' | |||
*Click '''Select condition file...''', browse and select the 6nA_ap5 condition and click '''OK''' | |||
*Click '''Edit parameter...''' | |||
*Click '''Execute''' in the new window | |||
The system will now display | |||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
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| [[image:9500calib1.png|600px]] | | [[image:9500calib1.png|600px]] || [[image:9500restor1.png|600px]] | ||
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