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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions

Mfarin (talk | contribs)
Mfarin (talk | contribs)
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|} ''*The E<sub>2</sub>-time value was changed and observed.''
|} ''*The E<sub>2</sub>-time value was changed and observed.''
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Regarding the measurements of the profiles, in a) the depth reached 3.17 µm with 0-15s of ramping, b) reached 3.21 µm with 1-15s of ramping, c) reached 2.87 µm whit 5-15s of ramping and d) reached 3.63 µm with 15 s without ramping. Even though the etching ramping times may appear similar, their ER have different and can be used accordingly to each requirements.  
Regarding the measurements of the profiles, in a) the depth reached 3.17 µm with 0-15s of ramping, b) reached 3.21 µm with 1-15s of ramping, c) reached 2.87 µm whit 5-15s of ramping and d) reached 3.63 µm with 15 s without ramping. Even though the etching ramping times may appear similar, there are differences in the feature profile. The ER for 0-15s and 1-15s is around 52 nm/min and for 5-15s and 15s is approximately 48 nm/min.


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