Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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For our example job we will use the following SDF. | For our example job we will use the following SDF. | ||
<pre> | <pre> | ||
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Pattern placement is controlled with the ARRAY command in the JDF. The goal of this example exposure is to create a dose test and thus we will use the ARRAY command to create an array of the pattern (the DTU logo) and we will use the MODULAT command to modulate the dose for each instance in the array. | |||
<pre> | |||
JOB/W 'MYFIRSTEBL',4 4inch wafer | |||
PATH DRF5M Cyclic calibration definition | |||
ARRAY (0,10,50)/(0,1,0) 10-1 array | |||
ASSIGN P(1)->((1,1),SHOT1) | |||
ASSIGN P(1)->((2,1),SHOT2) | |||
ASSIGN P(1)->((3,1),SHOT3) | |||
ASSIGN P(1)->((4,1),SHOT4) | |||
ASSIGN P(1)->((5,1),SHOT5) | |||
ASSIGN P(1)->((6,1),SHOT6) | |||
ASSIGN P(1)->((7,1),SHOT7) | |||
ASSIGN P(1)->((8,1),SHOT8) | |||
ASSIGN P(1)->((9,1),SHOT9) | |||
ASSIGN P(1)->((10,1),SHOT10) | |||
AEND | |||
PEND | |||
LAYER 1 | |||
P(1) 'dtu_logo_8mu.v30' | |||
SPPRM 4.0,,,,1.0,1 | |||
STDCUR 2.2 ;nA | |||
SHOT1: MODULAT (( 0,0)) | |||
SHOT2: MODULAT (( 0,5)) | |||
SHOT3: MODULAT (( 0,10)) | |||
SHOT4: MODULAT (( 0,15)) | |||
SHOT5: MODULAT (( 0,20)) | |||
SHOT6: MODULAT (( 0,25)) | |||
SHOT7: MODULAT (( 0,30)) | |||
SHOT8: MODULAT (( 0,35)) | |||
SHOT9: MODULAT (( 0,40)) | |||
SHOT10: MODULAT (( 0,45)) | |||
END | |||
</pre> | |||
Much more information on various commands in SDF/JDF files are available in the SDF and JDF file manual. [link] | Much more information on various commands in SDF/JDF files are available in the SDF and JDF file manual. [link] | ||