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Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,186 edits
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=SDF and JDF file preparation=
=SDF and JDF file preparation=
In order to execute the pattern writing a significant number of parameters must be defined for the job. These are defined in two text files; the Schedule Definition File (SDF) and Jobdeck Definition File (JDF). The system has a close to zero tolerance on syntax error from the user and thus these files should be prepared carefully, usually by using templates and correcting the parameters to suit your exposure. We encourage users to download and use SuperEdi for editing SDJ/JDF files. As the JEOL 9500 is operated from a Unix computer you must save your SDF/JDF files in Unix format, available as a option from the “Save As” menu in SuperEdi.


For our example job we will use the following files.
In order to execute the pattern writing a significant number of parameters must be defined for the job. These are defined in two text files; the Schedule File (SDF) and Jobdeck File (JDF). The system has a close to zero tolerance on syntax error from the user and thus these files should be prepared carefully, usually by using templates and correcting the parameters to suit the exposure. We encourage users to [https://www.wolosoft.com/en/superedi/ download and use SuperEdi] for editing SDJ/JDF files. As the JEOL 9500 is operated from a Unix computer you must save your SDF/JDF files in Unix format, available as an option from the “Save As” menu in SuperEdi.
 
The SDF is the governing job descriptor. It defines which cassette to use for exposure, which slot of that cassette to expose, which beam current to expose with and the base dose of the exposure. The SDF will reference the JDF with further job information such as which pattern to write and where to write the pattern. The JDF will in turn reference a (or set of) V30 pattern files that hold the pattern(s) to write.
 
For our example job we will use the following SDF.
 


<pre>
<pre>
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CALPRM '6na_ap5'              The condition file 6na_ap5 is used, i.e. exposure at 6 nA  
CALPRM '6na_ap5'              The condition file 6na_ap5 is used, i.e. exposure at 6 nA  
DEFMODE 2                    Both deflectors are used (default)
DEFMODE 2                    Both deflectors are used (default)
RESIST 240                   A base dose of 240 µC/cm2 is used  
RESIST 200                   A base dose of 200 µC/cm2 is used  
SHOT A,16                    The shot step between individual beam shots is 4 nm - steps of 0.25 nm
SHOT A,16                    Shot pitch is 16 units (of 0.25 nm), i.e. 4 nm
OFFSET(0,0)                  An offset of 0 µm is applied in both X and Y
OFFSET(0,0)                  An offset of 0 µm is applied in both X and Y
      
      
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</pre>
</pre>


!SDF and JDF file content with line numbers!


Description of commands.
Description of commands.
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