Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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=== Nanoholes === | === Nanoholes === | ||
The nanoholes are 200nm wide, with 400nm pitch with 100 nm Al<sub>2</sub>O<sub>3</sub> mask. During the recipe, Pegasus 2 conditions were: Outer EM=10A, T=20°C, no clamping, no He BGC and all heaters OFF. | The nanoholes are 200nm wide, with 400nm pitch with 100 nm Al<sub>2</sub>O<sub>3</sub> mask. During the recipe, Pegasus 2 conditions were: Outer EM=10A, T=20°C, no clamping, no He BGC and all heaters OFF. | ||
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[[File:nH R-power.png|500px|left|thumb|'''''Nanoholes profile when varying the removal power.<br> | [[File:nH R-power.png|500px|left|thumb|'''''Nanoholes profile when varying the removal power.<br> | ||
Photo: Maria Farinha @DTU Nanolab, April 2022''''']] | Photo: Maria Farinha @DTU Nanolab, April 2022''''']] | ||