Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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Using patterned samples of 1 μm pillars with 50 nm of Al<sub>2</sub>O<sub>3</sub>. After the tests, approximately 32nm of Al<sub>2</sub>O<sub>3</sub> were still intact. During the recipe, Pegasus 2 conditions were: Outer EM=10A, T=20°C, no clamping, no He BGC, no coil power and all heaters OFF. | Using patterned samples of 1 μm pillars with 50 nm of Al<sub>2</sub>O<sub>3</sub>. After the tests, approximately 32nm of Al<sub>2</sub>O<sub>3</sub> were still intact. During the recipe, Pegasus 2 conditions were: Outer EM=10A, T=20°C, no clamping, no He BGC, no coil power and all heaters OFF. | ||
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[[File:compare pillars.png|400px|left|thumb|'''''Pillars with different etching times. <br> | [[File:compare pillars.png|400px|left|thumb|'''''Pillars with different etching times. <br> | ||