Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
| Line 17: | Line 17: | ||
##Job verification | ##Job verification | ||
#Exposure session | #Exposure session | ||
##Sample | ##Sample loading | ||
##System calibration | ##System calibration | ||
##Exposure | ##Exposure | ||
##Cassette and sample unloading | ##Cassette and sample unloading | ||
#Development | #Development | ||
In the following we will look at each step in more detail and show step by step how to make a wafer/chip exposure. | In the following we will look at each step in more detail and show step by step how to make a wafer/chip exposure. | ||