Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 41: Line 41:
|'''Polarity'''
|'''Polarity'''
|'''Manufacturer'''
|'''Manufacturer'''
|'''Comments'''
|'''Technical reports'''
|'''Technical reports'''
|'''Spin Coater'''
|'''Spin Coater'''
|'''Polynomial'''
|'''Thinner'''
|'''Thinner'''
|'''Developer'''
|'''Developer'''
Line 57: Line 57:
|Positive
|Positive
|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
|Standard positive resist, very similar to ZEP520.
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info]  
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info]  
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV|Spin Coater: Gamma E-beam and UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV|Spin Coater: Gamma E-beam and UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
|a = 7252.2, b = -0.454
|Anisole
|Anisole
|
|
Line 77: Line 77:
|Negative
|Negative
|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
|Both e-beam and DUV sensitive resist.
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf AR-N 8200 info]
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf AR-N 8200 info]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
|a = ?, b = ?
|AR 600-07
|AR 600-07
|AR 300-47:DIW (1:1)
|AR 300-47:DIW (1:1)
Line 91: Line 91:
|Negative
|Negative
|[http://www.allresist.com AllResist]
|[http://www.allresist.com AllResist]
|Both e-beam, DUV and UV-sensitive resist.
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info]
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
|a = ?, b = ?
|PGMEA
|PGMEA
|
|
Line 106: Line 106:
|}
|}


{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
|-
|-
|-style="background:silver; color:black"
|'''Resist'''
|'''Polarity'''
|'''Manufacturer guidelines'''
|'''Spin Coater'''
|'''Thinner'''
|'''Developer'''
|'''Stopper'''
|'''Remover'''
|'''Polynomial'''
|'''Soft bake'''
|-
|-
|-style="background:WhiteSmoke; color:black"
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR 62 / AR-P 6200.09]]'''
|Positive
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf CSAR 62 info]
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
|AR 600-02 / Anisole
|AR 600-546
|AR 600-60 / IPA
|AR 600-71 / 1165 Remover
| a = 7252.2, b = -0.454
|180C, 3-10 min
|-
|-style="background:LightGrey; color:black"
|'''[[Specific_Process_Knowledge/Lithography/ARN8200|Medusa 82 / AR-N 8200.06]]'''
|Negative
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf Medusa 82 info]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
|AR 600-07
|AR 300-47
|DIW
|BOE
| a = ?, b = ?
|150C, 10 min
|-
|-style="background:LightGrey; color:black"
|'''AR-N 7520'''
|Negative
|[https://www.allresist.com/wp-content/uploads/sites/2/2022/03/Allresist_Product-information-E-Beamresist-AR-N-7520new-English-web.pdf AR-N 7520 info]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]]
|AR 300-12 / PGMEA
|AR 300-47
|DIW
|AR 300-73 / acetone
| a = ?, b = ?
|85C, 90 sec
|}


Resist thickness as function of spin speed on Lab Spin 2/3 can be estimated from the parameters above as y = ax^b, where y is resist thickness in nm and x is spin speed in RPM.
Resist thickness as function of spin speed on Lab Spin 2/3 can be estimated from the parameters above as y = ax^b, where y is resist thickness in nm and x is spin speed in RPM.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/FirstEBL"