Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=My First JEOL 9500 Exposure Guide= | =My First JEOL 9500 Exposure Guide= | ||
The JEOL 9500 E-beam writer offers world class performance, this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. In this guide we will set up a simple wafer/chip exposure. The complexity is kept at | The JEOL 9500 E-beam writer offers world class performance, this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. In this guide we will set up a simple wafer/chip exposure using a single beam current and without pattern alignment. The complexity of this job is kept at the lowest level possible and we encourage new users to make sure their first job (first training session) matches this complexity level. More complex jobs can be run when a user is more familiar with the system. | ||
Training on the JEOL 9500 system can be requested by sending a mail to [mailto:e-beam@nanolab.dtu.dk e-beam@nanolab.dtu.dk]. Please attach a process flow and any other relevant information for your process. Be advised that the booking calendar on the JEOL 9500 system is always very full, typically a user can expect the first training session about four weeks after the initial request. | Training on the JEOL 9500 system can be requested by sending a mail to [mailto:e-beam@nanolab.dtu.dk e-beam@nanolab.dtu.dk]. Please attach a process flow and any other relevant information for your process. Be advised that the booking calendar on the JEOL 9500 system is always very full, typically a user can expect the first training session about four weeks after the initial request. | ||