Specific Process Knowledge/Etch/III-V ICP/GaAs-AlGaAs: Difference between revisions
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![[image:ICP_BCL3_result.jpg|300x300px|thumb|left|Result of GaAs etching with BCl<sub>3</sub>. Qijiang Ran, DTU Photonics, 2011. ]] | ![[image:ICP_BCL3_result.jpg|300x300px|thumb|left|Result of GaAs etching with BCl<sub>3</sub>. Done by: Qijiang Ran, DTU Photonics, 2011. ]] | ||
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