Jump to content

Specific Process Knowledge/Etch/III-V ICP/GaAs-AlGaAs: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,315 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,315 edits
Line 2: Line 2:
   
   
===GaAs/AlGaAs etching using III-V ICP===
===GaAs/AlGaAs etching using III-V ICP===
'''''Work done by DTU Photonics before 2011'''''
'''''Recipes developed and/or tested by DTU Photonics internal before 2011'''''


{| border="1" cellspacing="2" cellpadding="3"  
{| border="1" cellspacing="2" cellpadding="3"  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP/GaAs-AlGaAs"