Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions
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'''''All images on this page has been created by Peixiong Shi, DTU Nanloab''''' <br> | |||
==Images stepper_6A1_feb262013_step9== | ==Images stepper_6A1_feb262013_step9== | ||
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4"> | <gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4"> | ||
image:8mm from wafer edge_074.jpg | image:8mm from wafer edge_074.jpg | ||
Revision as of 09:34, 10 February 2023
All images on this page has been created by Peixiong Shi, DTU Nanloab
Images stepper_6A1_feb262013_step9
- 6A1_feb262013_step9
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Images stepper_6A4_feb262013_step9
- 6A4_feb262013_step9
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wafer edge -
wafer edge -
wafer edge -
wafer edge -
Position of the scanning: wafer edge -
wafer edge -
wafer edge -
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wafer center -
wafer center -
wafer center -
wafer center
Images Stepper_6A5_feb272013
- 6A5_feb262013 step9 and step10
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Wafer edge -
Wafer edge -
Wafer edge -
Wafer edge -
Wafer edge -
Wafer edge -
Wafer center -
Wafer center -
Wafer center -
Wafer center -
Wafer center -
Top view -
Top view -
Top view -
Top view -
Top view -
Top view
images 3
- 6A1_feb262013_step9