Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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''January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.'' | ''January 2023: The RTP Annealsys is being tested, but it is not released for general use yet. Please contact thinfilm@nanolab.dtu.dk for more information.'' | ||
'''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - | '''RTP Annealsys (RTP AS-Premium, serial number AS0415C4 - 8177, from ANNEALSYS)''' is a research tool available at DTU Nanolab that can reach very high temperatures in a matter of a few minutes or even seconds. Therefore, it is able to perform several types of rapid thermal processing and it can be used as a multi-functional and versatile microfabrication tool, within specific process windows for each process type, using Si/nanofabricated Si structures. Amongst them, there is rapid thermal annealing '''(RTA)''', hydrogenation '''(RTH)''', oxidation '''(RTO)''', nitridation '''(RTN)''', etc. Currently, it is used for '''rapid thermal annealing and smoothing''' of silicon-based samples. | ||
[[File:LL&station Annealsys.png|450px|thumb|right|The RTP Annealsys work station and loadlock are located in the DTU Nanolab cleanroom B-1. Photo: Maria Farinha@DTU Nanolab, February 2023]] | [[File:LL&station Annealsys.png|450px|thumb|right|The RTP Annealsys work station and loadlock are located in the DTU Nanolab cleanroom B-1. Photo: Maria Farinha@DTU Nanolab, February 2023]] | ||
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The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | ||
The chamber has stainless steel walls (water-cooled) and a top and bottom halogen lamp-configuration ( | The chamber has stainless steel walls (water-cooled) and a top and bottom halogen lamp-configuration (28 infra-red lamps, in total). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and these are air-cooled. It is also connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is connected to two external pumps. | ||
Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under turbo vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under turbo vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | ||