Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
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==Dry etch with Hard mask== | ==Dry etch with Hard mask== | ||
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The recipe ICP is on ICP metal call: A SiO2 etch with C4F8 with resist mask<br> | The recipe ICP is on ICP metal call: A SiO2 etch with C4F8 with resist mask<br> | ||
I had problems with this recipe - it gave polymer on the surface, therefor I do not have more info on that.<br> | I had problems with this recipe - it gave polymer on the surface, therefor I do not have more info on that.<br> | ||
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