Specific Process Knowledge/Thermal Process/Oxidation/Standard oxidation recipes: Difference between revisions
Appearance
No edit summary |
|||
| Line 2: | Line 2: | ||
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>= | =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>= | ||
''This page is written by DTU Nanolab internal'' | |||
The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers. | The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers. | ||