Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Si etch: Difference between revisions
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=Results for Si etching in the IBE= | =Results for Si etching in the IBE= | ||
''Made by Kristian Hagsted Rasmussen@Nanotech in 2011'' <br | ''Made by Kristian Hagsted Rasmussen@Nanotech in 2011'' <br> | ||
The silicon etch test was made as a preliminary test of the IBE system, to obtain a feeling of the system capabilities and the different parameters influence on the etch outcome. A throughout characterization of the wafers was not carried out. However, the most important results are listed here. | The silicon etch test was made as a preliminary test of the IBE system, to obtain a feeling of the system capabilities and the different parameters influence on the etch outcome. A throughout characterization of the wafers was not carried out. However, the most important results are listed here. | ||