Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE blazed gratings: Difference between revisions

Latest revision as of 15:28, 6 February 2023

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This page is written by Berit Herstrøm @ DTU Nanolab (BGHE) if nothing else is stated

by bghe@nanolab experiments made in June/July 2012

Some examples of blazed gratings in fused silica etched with Cr and DUV resist as masking layer
30 min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
*Rotation speed 0 rpm
*Angle: -35
*I(N)=400mA
*RF power=1300W
*I(B)=300mA
*V(B)=300V
*V(AC,B)=500V
*Ar(N) flow=5sccm
*Ar(B) flow=5sccm
*CHF3 flow=15sccm
45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3
*Rotation speed 0 rpm
*Angle: -35
*I(N)=400mA
*RF power=1300W
*I(B)=300mA
*V(B)=300V
*V(AC,B)=500V
*Ar(N) flow=5sccm
*Ar(B) flow=5sccm
*CHF3 flow=15sccm
20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings
*Rotation speed 0 rpm
*Angle: -35
*I(N)=550mA
*RF power=1300W
*I(B)=500mA
*V(B)=600V
*V(AC,B)=400V
*Ar(N) flow=5sccm
*Ar(B) flow=10sccm
*CHF3 flow=0sccm
15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3
*Rotation speed 0 rpm
*Angle: -35
*I(N)=400mA
*RF power=1300W
*I(B)=300mA
*V(B)=300V
*V(AC,B)=500V
*Ar(N) flow=5sccm
*Ar(B) flow=5sccm
*CHF3 flow=15sccm

@@ Line 1: / Line 1: @@
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/IBE_blazed_gratings click here]'''
+<br> {{CC-bghe1}}
 *60nm Barc
 *360nm KRF resist
-''by bge@nanolab'' experiments made in June/July 2012
+''by bghe@nanolab'' experiments made in June/July 2012
 <gallery caption="Some examples of blazed gratings in fused silica etched with Cr and DUV resist as masking layer "  widths="300px" heights="250px">