Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
No edit summary |
|||
| Line 7: | Line 7: | ||
==IBE/IBSD Ionfab 300: milling and dry etching == | ==IBE/IBSD Ionfab 300: milling and dry etching == | ||
[[Image:IBE_IBSD_udstyret_i_RR1.jpg|300x300px|thumb|IBE and IBSD: positioned in cleanroom A-1]] | [[Image:IBE_IBSD_udstyret_i_RR1.jpg|300x300px|thumb|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]] | ||
IBE/IBSD Ionfab 300 was manufactored by Oxford Instruments Plasma Technology. It was installed at Nanolab in 2011. | IBE/IBSD Ionfab 300 was manufactored by Oxford Instruments Plasma Technology. It was installed at Nanolab in 2011. | ||