Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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According to specs, the writing speed of Aligner: Maskless 03 is 1100mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode reduces this speed to approximately 440mm<sup>2</sup>/min. The writing speed for a 100x100mm<sup>2</sup> area measured during installation of the machine (acceptance test) was ~1200mm<sup>2</sup>/min. | According to specs, the writing speed of Aligner: Maskless 03 is 1100mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode reduces this speed to approximately 440mm<sup>2</sup>/min. The writing speed for a 100x100mm<sup>2</sup> area measured during installation of the machine (acceptance test) was ~1200mm<sup>2</sup>/min. | ||
[[Image:MLA3_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 03 as a function of the exposure area]] | [[Image:MLA3_speedVSarea.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 03 as a function of the exposure area. Data and graph by Thomas Anhøj @ DTU Nanolab, 2020.]] | ||
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[[Image:MLA3_speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 03 as a function of the exposure dose]] | [[Image:MLA3_speedVSdose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 03 as a function of the exposure dose. Data and graph by Thomas Anhøj @ DTU Nanolab, 2020.]] | ||
'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||