Specific Process Knowledge/Characterization/XRD/Process Info: Difference between revisions
| Line 68: | Line 68: | ||
==XRR== | ==XRR== | ||
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="700px" heights=" | <gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="700px" heights="150px" perrow="2"> | ||
image:eves_XRD_drawing_series_XRR1_20230206.png|<b>C 1s</b> signal. | image:eves_XRD_drawing_series_XRR1_20230206.png|<b>C 1s</b> signal. | ||
image:eves_XRD_drawing_series_XRR2_20230206.png|<b>C 1s</b> signal. | image:eves_XRD_drawing_series_XRR2_20230206.png|<b>C 1s</b> signal. | ||