Specific Process Knowledge/Characterization/XRD/Process Info: Difference between revisions
| Line 39: | Line 39: | ||
==2θ scan. Graizing Incident X-ray Diffraction (GiXRD)== | ==2θ scan. Graizing Incident X-ray Diffraction (GiXRD)== | ||
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="800px" heights="550px" perrow="1"> | |||
image:eves_XRD_drawing_series_GiXRD_20230206.png|<b>C 1s</b> signal. | |||
</gallery> | |||
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1"> | <gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1"> | ||
image:eves_2theta_scan_concept_20230131.png|<b>C 1s</b> signal. | image:eves_2theta_scan_concept_20230131.png|<b>C 1s</b> signal. | ||